【3rd July】Novel High-resolution Patterning Technologies for Photosensitive Film
日期：2015-07-03
閱讀：899
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TITLE: Novel High-resolution Patterning Technologies for Photosensitive Film?
SPEAKER: Dr. Yasuharu Murakami, General manager of Hitachi Chemical Tsukuba Research Laboratory
TIME: July 3 (Friday) AM10:00?
LOCATION: 410 Meeting Room， Chemistry Building B (化學(xué)B樓410會(huì)議室)
INVITER: Prof. Jiang Xuesong (姜學(xué)松 研究員)
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Dr. Yasuharu Murakami completed BSc and MSc degrees in Engineering at Kanagawa. In 1996, he obtained his PhD in Engineering at Tokyo Institute of Technology. Then, he worked in Hitachi Chemical Co., Ltd. as a researcher. From 2002-2003, he worked as visiting researcher in Cornell University. From 2005-2008, he worked as a senior researcher in Hitachi Chemical-Shanghai Jiao Tong University R&D Center. In 2015, he was promoted as a general manager of Hitachi Chemical Tsukuba Research Laboratory. His current research interests include telecommunication materials, especially photopolymers for microlithography.
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